P-type Al-doped Cr-deficient CrN thin films for thermoelectrics

Abstract

Thermoelectric properties of chromium nitride (CrN)-based films grown on c-plane sapphire by dc reactive magnetron sputtering were investigated. In this work, aluminum doping was introduced in CrN (degenerate n-type semiconductor) by co-deposition. Under the present deposition conditions, over-stoichiometry in nitrogen (CrN1+delta) rock-salt structure is obtained. A p-type conduction is observed with nitrogen-rich CrN combined with aluminum doping. The Cr0.96Al0.04N1.17 film exhibited a high Seebeck coefficient and a sufficient power factor at 300 degrees C. These results are a starting point for designing p-type/n-type thermoelectric materials based on chromium nitride films, which are cheap and routinely grown on the industrial scale. (C) 2018 The Japan Society of Applied Physics ; Funding Agencies|European Research Council under the European Communitys Seventh Framework Programme (FP)/ERC [335383]; Swedish Foundation for Strategic Research (SSF) through the Future Research Leaders 5 program; Swedish Research Council (VR) [621-2012-4430, 2016-03365]; Knut and Alice Wallenberg Foundation through the Wallenberg Academy Fellows program; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University [2009 00971]; M.ERA-NET project MC2 - French ANR program [ANR-13-MERA-0002-02]; CTEC project [1305-00002B]