Suchergebnisse

Die Fertigung in der Halbleiterindustrie ist geprägt durch eine Vielfalt und Vielzahl von Elementen sowie eine Dynamik und Unsicherheit in deren Verhalten. Die Produktionsplanung und -steuerung hat die Aufgabe, das Produktionsprogramm unter Berücksichtigung dieser Komplexität dennoch möglichst wirtschaftlich zu realisieren. Vielversprechende Ansätze aus der Systemdynamik wurden bisher kaum berücksichtigt, deren Nutzen sowie Anwendung in diesem Beitrag aufgezeigt werden.
 
Manufacturing in the semiconductor industry is characterized by a variety and multitude of elements as well as dynamics and uncertainty in their behavior. The task of production planning and control is to implement the production program as economically as possible while taking this complexity into account. So far, promising approaches from the field of system dynamics have hardly been considered, and their benefits and applications are shown in this article.

Unternehmen sehen in Big-Data-Analysen ein großes Potenzial zur Optimierung der klassischen Produktionsziele sowie zur Entwicklung neuer Geschäftsmodelle. Eine Studie des Fraunhofer IPA analysiert, welche Herausforderungen bei der Umsetzung dieser Potenziale auftreten. Darauf aufbauend werden Entwicklungsfelder für die angewandte Forschung und produzierende Unternehmen erarbeitet.
 
Companies expect huge benefits from big data analytics both to improve traditional production targets and to develop new business models. A study conducted by Fraunhofer IPA analyzes the upcoming challenges in exploiting these opportunities. It provides the basis for identifying areas of development for applied research and for manufacturing companies.

Der Fachbeitrag konzentriert sich auf die parametergerechte 3D-CAD-Modellierung von Tiefziehwerkzeugen und deren Beschreibung in einer neuen grafischen Sprache. Die neu zu entwickelnde Modellierungssprache für die Domäne der Tiefziehwerkzeuge soll die Kommunikation zwischen Konstrukteur und CAD-Programm vereinfachen. Die Modellierung von CAD-Modellen für Tiefziehwerkzeuge wird damit flexibler und zeiteffizienter gestaltet.
 
This study focuses on parameter-based 3D CAD modelling of deep drawing tools as well as their description in a new graphical modelling language. The newly developed modelling language for the domain of the deep drawing tools should simplify the communication between designer and CAD program, whereby the CAD modelling of deep drawing tools should be more flexible and more time-efficient.

This is the report from the "ECVAM-EFPIA workshop on 3T3 NRU Phototoxicity Test: Practical Experience and Implications for Phototoxicity Testing", jointly organized by ECVAM and EFPIA and held on the 25-27 October 2010 in Somma Lombardo, Italy. The European Centre for the Validation of Alternative Methods (ECVAM) was established in 1991 within the European Commission Joint Research, based on a Communication from the European Commission (1991). The main objective of ECVAM is to promote the scientific and regulatory acceptance of alternative methods which are of importance to the biosciences and which reduce, refine and replace the use of laboratory animals. The European Federation of Pharmaceuticals Industries and Association (EFPIA) represent the pharmaceutical industry operating in Europe. Through its direct membership of 31 national associations and 40 leading pharmaceutical companies, EFPIA is the voice on the EU scene of 2200 companies committed to researching, developing and bringing to patients new medicines that improve health and the quality of life around the world. The workshop, co-chaired by Joachim Kreysa (ECVAM) and Phil Wilcox (GSK, EFPIA) involved thirty-five experts from academia, regulatory authorities and industry, invited to contribute with their experiences in the field of phototoxicology. The main objectives of the workshop were: - to present 'in use' experience of the pharmaceutical industry with the 3T3 Neutral Red Uptake Phototoxicity Test (3T3 NRU-PT), - to discuss why it differs from the results in the original validation exercise, - to discuss technical issues and consider ways to improve the usability of the 3T3 NRU-PT for (non-topical) pharmaceuticals, e.g., by modifying the threshold of chemical light absorption to trigger photo-toxicological testing, and by modifying technical aspects of the assay, or adjusting the criteria used to classify a positive response. During the workshop, the assay methodology was reviewed by comparing the OECD Test Guideline (TG 432) with the protocols used in testing laboratories, data from EFPIA and JPMA 'surveys' were presented and possible reasons for the outcomes were discussed. Experts from cosmetics and pharmaceutical industries reported on their experience with the 3T3 NRU-PT and evidence was presented for phototoxic clinical symptoms that could be linked to certain relevant molecules. Brainstorming sessions discussed if the 3T3 NRU-PT needed to be improved and whether alternatives to the 3T3 NRU-PT exist. Finally, the viewpoint from EU and US regulators was presented. In the final session, the conclusions of the meeting were summarized, with action points. It was concluded that the 3T3 NRU-PT identifies phototoxicological hazards with a 100% sensitivity, and thus is accepted as the tier one test that correctly identifies the absence of phototoxic potential. Consequently, positive results in the 3T3 NRU-PT often do not translate into a clinical phototoxicity risk. Possible ways to improve the practical use of this assay include: (i) adaptation of changed UV/vis-absorption criteria as a means to reduce the number of materials tested, (ii) reduction of the highest concentration to be tested, and (iii) consideration of modifying the threshold criteria for the prediction of a positive call in the test.