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Due to a large discrepancy between theory and experiment, the electronic character of crystalline boron carbide B13C2 has been a controversial topic in the field of icosahedral boron-rich solids. We demonstrate that this discrepancy is removed when configurational disorder is accurately considered in the theoretical calculations. We find that while the ordered ground state B13C2 is metallic, the configurationally disordered B13C2, modeled with a superatom-special quasirandom structure method, goes through a metal to nonmetal transition as the degree of disorder is increased with increasing temperature. Specifically, one of the chain-end carbon atoms in the CBC chains substitutes a neighboring equatorial boron atom in a B-12 icosahedron bonded to it, giving rise to a B11Ce(BBC) unit. The atomic configuration of the substitutionally disordered B13C2 thus tends to be dominated by a mixture between B-12(CBC) and B11Ce(BBC). Due to splitting of valence states in B11Ce(BBC), the electron deficiency in B-12(CBC) is gradually compensated. ; Funding Agencies|Swedish Research Council (VR) [621-2011-4417, 330-2014-6336, 2014-4750]; CeNano at Linkoping University; LiLi-NFM; Swedish Government Strategic Research Area Grant in Materials Science

The spinodal decomposition and thermal stability of thin In0.72Al0.28N layers and In0.72Al0.28N/AlN superlattices with AlN(0001) templates on Al2O3(0001) substrates was investigated by in-situ heating up to 900 degrees C. The thermally activated structural and chemical evolution was investigated in both plan-view and cross-sectional geometries by scanning transmission electron microscopy in combination with valence electron energy loss spectroscopy. The plan-view observations demonstrate evidence for spinodal decomposition of metastable In0.72Al0.28N after heating at 600 degrees C for 1 h. During heating compositional modulations in the range of 2-3 nm-size domains are formed, which coarsen with applied thermal budgets. Cross-sectional observations reveal that spinodal decomposition begin at interfaces and column boundaries, indicating that the spinodal decomposition has a surface-directed component. ; Funding Agencies|Swedish Research Council (VR) [621-2012-4420, 621-2012-4359, 622-2008-405]; European Research Council (ERC); Swedish Foundation for Strategic research (SSF) through the Nano-N program; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University [SFO-Mat-LiU 2009-00971]; Knut and Alice Wallenberg Foundation

The potential of quarternary wurtzite TMx/2Mx/2Al1-xN (TM = Ti, Zr, Hf; M = Mg, Ca, Zn) alloys for piezoelectric applications is investigated using first-principles calculations. All considered alloys show increased piezoelectric response compared to pure AlN, and competing with the best ternary system proven to date: ScAlN. (Zr, Hf)(x/2)(Mg, Ca)(x/2)Al1-xN alloys are particularly promising. Calculations reveal positive mixing enthalpies indicative for phase separating systems; their values are smaller compared to related nitride alloys, which still can be grown as metastable thin films. The wurtzite phase of the alloys is lowest in energy at least up to x = 0.5 and for Tix/2Znx/2Al1-xN in the full composition range. Moreover, calculations reveal that wurtzite TM0.5Zn0.5N (TM = Ti, Zr, Hf) are piezoelectric alloys with d(33,f) = 19.95, 29.89, and 24.65 pC/N respectively, up to six times that of AlN. Finally, we discuss the physical origin behind the increased piezoelectric response and show that the energy difference between tetrahedrally coordinated zinc-blende (B3) and the layered hexagonal (B-k) phases of the TM0.5M0.5N alloy can be used as a descriptor in a high-throughput search for complex wurtzite alloys with high piezoelectric response. ; Funding Agencies|Knut and Alice Wallenberg Foundation Scholar Grant; Swedish Research Council (VR) Linkoping Linnaeus Initiative LiLi-NFM [2008-6572]; Swedish Government Strategic Research Area Grant in Materials Science on Advanced Functional Materials [MatLiU 2009-00971]; Swedish Research Council [621-2011-4417, 330-2014-6336]; Swedish Foundation for Strategic Research (SSF) Programme SRL [10-0026]; Swedish Research Council (VR) [621-2011-4426]

Glancing angle deposition (GLAD) of AlN nanostructures was performed at room temperature by reactive magnetron sputtering in a mixed gas atmosphere of Ar and N-2. The growth behavior of nanostructures shows strong dependence on the total working pressure and angle of incoming flux. In GLAD configuration, the morphology changed from coalesced, vertical nanocolumns with faceted terminations to highly inclined, fan-like, layered nanostructures (up to 38 degrees); while column lengths decreased from around 1743 to 1068 nm with decreasing pressure from 10 to 1.5 mTorr, respectively. This indicates a change in the dominant growth mechanism from ambient flux dependent deposition to directional ballistic shadowing deposition with decreasing working pressures, which is associated with the change of energy and incident angle of incoming reactive species. These results were corroborated using simulation of metal transport (SiMTra) simulations performed at similar working pressures using Ar and N separately, which showed the average particle energy and average angle of incidence decreased while the total average scattering angle of the metal flux arriving at substrate increased with increasing working pressures. Observing the crystalline orientation of GLAD deposited wurtzite AlN nanocolumns using X-ray diffraction (XRD), pole-figure measurements revealedc-axis growth towards the direction of incoming flux and a transition from fiber-like to biaxial texture took place with increasing working pressures. Under normal deposition conditions, AlN layer morphology changed from {0001} to {10 (1) over bar1} with increasing working pressure because of kinetic energy-driven growth. ; Funding Agencies|VetenskapsradetSwedish Research Council [2018-04198]; Energimyndigheten [46658-1]; Stiftelsen Olle Engkvist ByggmastareSwedish Research Council [197-0210]; Linkoping University Library; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University [SFO-Mat-LiU 2009-00971]

Thin films in the aluminosilicate (AlSiO) system containing up to 31 at. % Al and 23 at. % Si were prepared by reactive RF magnetron co-sputtering in order to investigate the dependence of film formation and optical properties on substrate temperature and Si and Al contents. The obtained films were amorphous with smooth microstructure. The growth rate at different substrate temperatures ranged from 1.2 to 3.3 nm/min and increase with increasing the Si target power. The roughness decreases and thickness increases with increasing Si content. The thickness of the films grown at a deposition temperature of 100 °C is found to be higher than the films deposited at 300 and 500 °C. The AlSiO-coated glasses have a higher transmission in the visible region than the uncoated glass. The spectroscopic ellipsometry analysis reveals that the refractive index value decreased with decreasing the Al content, having extinction coefficient values of zero in the measured spectral region and band gap values ≥ 3.4 eV. The obtained thin films have over 90% transmittance in the visible range and no systematic variation of transmittance was observed with substrate temperature. The results suggest that glass substrate coated with AlSiO thin films have improved optical properties. ; Fulltext published with Attribution 4.0 International (CC BY 4.0) license. https://creativecommons.org/licenses/by/4.0/ No changes to PDF. Funding: VinnovaVinnova [2015-04809]; AForsk foundation [14-457]; Knut and Alice Wallenberg Foundation through the Wallenberg Academy Fellows program; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University (Faculty Grant SFO-Mat-LiU) [2009 00971]

Ca-Si-O-N thin films were deposited on commercial soda-lime silicate float glass, silica wafers and sapphire substrates by RF magnetron co-sputtering from Ca and Si targets in an Ar/N-2/O-2 gas mixture. Chemical composition, surface morphology, hardness, reduced elastic modulus and optical properties of the films were investigated using X-ray photoelectron spectroscopy, scanning electron microscopy, nanoindentation, and spectroscopic ellipsometry. It was found that the composition of the films can be controlled by the Ca target power, predominantly, and by the reactive gas flow. Thin films in the Ca-Si-O-N system are composed of N and Ca contents up to 31 eq. % and 60 eq. %, respectively. The films thickness ranges from 600 to 3000 nm and increases with increasing Ca target power. The films surface roughness varied between 2 and 12 nm, and approximately decreases with increasing power of Ca target. The hardness (4-12 GPa) and reduced elastic modulus (65-145 GPa) of the films increase and decrease with the N and Ca contents respectively. The refractive index (1.56-1.82) is primarily dictated by the N content. The properties are compared with findings for bulk glasses in the Ca-Si-(Al)-O-N systems, and it is concluded that Ca-Si-O-N thin films have higher values of hardness, elastic modulus and refractive index than bulk glasses of similar composition. (C) 2017 Elsevier B.V. All rights reserved. ; Funding Agencies|AForsk Foundation [14-457]; Vinnova [2015-04809]; European Research Council under the European Commission Seventh Framework Programme (FP)/ERC [335383]; Swedish Foundation for Strategic Research (SSF) through the Future Research Leaders 5 Program; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University Faculty Grant SFO Mat LiU [2009 00971]

The influence of B4C incorporation during magnetron sputter deposition of Cr/Sc multilayers intended for soft X-ray reflective optics is investigated. Chemical analysis suggests formation of metal: boride and carbide bonds which stabilize an amorphous layer structure, resulting in smoother interfaces and an increased reflectivity. A near-normal incidence reflectivity of 11.7%, corresponding to a 67% increase, is achieved at λ = 3.11 nm upon adding 23 at.% (B + C). The advantage is significant for the multilayer periods larger than 1.8 nm, where amorphization results in smaller interface widths, for example, giving 36% reflectance and 99.89% degree of polarization near Brewster angle for a multilayer polarizer. The modulated ion-energy-assistance during the growth is considered vital to avoid intermixing during the interface formation even when B + C are added. ; Funding agencies: Swedish Science Council; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University (Faculty Grant SFO-Mat-LiU) [2009 00971]

We study microstructure, mechanical, and corrosion properties of Zr1-xCrxBy coatings deposited by hybrid high power impulse/DC magnetron co-sputtering (CrB2-HiPIMS/ZrB2-DCMS). Cr/(Zr + Cr) ratio, x, increases from 0.13 to 0.9, while B/(Zr + Cr) ratio, y, decreases from 2.92 to 1.81. As reference, ZrB2.18 and CrB1.81 layers are grown at 4000 W DCMS. ZrB2.18 and CrB1.81 columns are continual from near substrate toward the surface with open column boundaries. We find that the critical growth parameter to achieve dense films is the ratio of Cr+- dominated ion flux and the (Zr + B) neutral flux from the ZrB2 target. Thus, the alloys are categorized in two groups: films with x = 0.32 (high Cr+/(Zr + B) ratios) that Cr+-dominated ion fluxes are sufficient to interrupt continuous columns, resulting in smooth surface and dense fine-grain microstructure. The pulsed metal-ion irradiation is more effective in film densification than continuous Ar+ bombardment. Dense Zr0.46Cr0.54B2.40 and Zr0.10Cr0.90B1.81 alloys are hard (> 30 GPa) and almost stress-free with relative nano indentation toughness of 1.3 MPa root m and 2.3 MPa root m, respectively, and remarkedly low corrosion rates (~& nbsp;1.0 x 10(-6) mA/cm(2) for Zr0.46Cr0.54B2.40 and~& nbsp; 2.1 x 10(-6) mA/cm(2) for Zr0.10Cr0.90B1.81). ; Funding Agencies|Swedish Research Council VR [2018-03957, 2019-00191, 2021-00357]; Swedish Energy Agency [51201-1]; Swedish for Strategic Research (SSF); Swedish National Graduate School in Neutron Scattering (SwedNess); Swedish Government Strategic Research Area in Materials Science on Advanced Functional Materials (AFM) at Linkoping University (Faculty Grant SFO Mat LiU)

Selective-area grown, catalyst-free GaN nanorod (NR) arrays grown on Si substrates have been realized using liquid-target reactive magnetron sputter epitaxy (MSE). Focused ion beam lithography (FIBL) was applied to pattern Si substrates with TiN(x)masks. A liquid Ga target was sputtered in a mixture gas of Ar and N-2, ranging the N(2)partial pressure (P-N) ratio from 100% to 50%. The growth of NRs shows a strong correlation withP(N)on the selectivity, coalescence, and growth rate of NRs in both radial and axial directions. The growth rate of NRs formed inside the nanoholes increases monotonically withP(N). TheP(N)ratio between 80% and 90% was found to render both a high growth rate and high selectivity. When theP(N)ratio was below 80%, multiple NRs were formed in the nanoholes. For aP(N)ratio higher than 90%, parasitic NRs were grown on the mask. An observed dependence of growth behavior upon theP(N)ratio is attributed to a change in the effective Ga/N ratio on the substrate surface, as an effect of impinging reactive species, surface diffusivity, and residence time of adatoms. The mechanism of NR growth control was further investigated by studying the effect of nanoholes array pitch and growth temperature. The surface diffusion and the direct impingement of adatoms were found to be the dominant factors affecting the lateral and axial growth rates of NR, respectively, which were well elucidated by the collection area model. ; Funding Agencies|Energimyndigheten [46658-1]; VetenskapsradetSwedish Research Council [2018-04198]; Stiftelsen Olle Engkvist ByggmastareSwedish Research Council [197-0210]; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University [SFO-Mat-LiU 2009-00971]; Energimyndigheten

In this work, amorphous thin films in Mg-Si-O-N system typically containing amp;gt; 15 at.% Mg and 35 at.% N were prepared in order to investigate especially the dependence of optical and mechanical properties on Mg composition. Reactive RF magnetron co-sputtering from magnesium and silicon targets were used for the deposition of Mg-Si-O-N thin films. Films were deposited on float glass, silica wafers and sapphire substrates in an Ar, N-2 and O-2 gas mixture. X-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, spectroscopic ellipsometry, and nanoindentation were employed to characterize the composition, surface morphology, and properties of the films. The films consist of N and Mg contents up to 40 at.% and 28 at.%, respectively and have good adhesion to substrates and are chemically inert. The thickness and roughness of the films increased with increasing content of Mg. Both hardness (16-21 GPa) and reduced elastic modulus (120-176 GPa) are strongly correlated with the amount of Mg content. The refractive index up to 2.01 and extinction coefficient up to 0.18 were found to increase with Mg content. The optical band gap (3.1-4.3) decreases with increasing the Mg content. Thin film deposited at substrate temperature of 100 degrees C shows a lower value of hardness (10 GPa), refractive index (1.75), and higher values of reduced elastic modulus (124 GPa) as compared to the thin film deposited at 310 degrees C and 510 degrees C respectively, under identical synthesis parameters. ; Funding Agencies|VINNOVA [2015-04809]; AForsk Foundation [14-457]; European Research Council under the European Community/ERC [335383]; Swedish Foundation for Strategic Research (SSF); Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University [2009 00971]

Catalyst-free GaN nanorod regular arrays have been realized by reactive magnetron sputter epitaxy. Two nanolithographic methods, nanosphere lithography (NSL) and focused ion beam lithography (FIBL), were applied to pattern Si substrates with TiNx masks. The growth temperature was optimized for achieving selectivity and well-faceted nanorods grown onto the NSL-patterned substrates. With increasing temperature from 875 to 985 °C, we observe different growth behaviors and associate them with selective insensitive, diffusion-dominated, and desorption-dominated zones. To further achieve site-specific and diameter control, these growth parameters were transferred onto FIBL-patterned substrates. Further investigation into the FIBL process through tailoring of milling current and time in combination with varying nanorod growth temperature, suggests that minimization of mask and substrate damage is the key to attain uniform, well-defined, single, and straight nanorods. Destruction of the mask results in selective area growth failure, while damage of the substrate surface promotes inclined nanorods grown into the openings, owning to random oriented nucleation. ; Funding agencies: Swedish Research Council (VR) [621-2012-4420, 621-2013-5360, 2016-04412]; Swedish Governmental Agency for Innovation Systems (VINNOVA) under the VINNMER international qualification program; Swedish Foundation for Strategic Research (SSF) [RIF 14-0074]; Sw