Suchergebnisse

A study of the electronic conduction mechanisms and electrically active defects in polycrystalline Sb2Se3 is presented. It is shown that for temperatures above 200 K, the electrical transport is dominated by thermal emission of free holes, ionized from shallow acceptors, over the intergrain potential barriers. In this temperature range, the temperature dependence of the mobility of holes, limited by the intergrain potential barriers, is the main contributor to the observed thermal activation energy of the conductivity of 485 meV. However, at lower temperatures, nearest-neighbor and Mott variable range hopping transport in the bulk of the grains turn into the dominant conduction mechanisms. Important parameters of the electronic structure of the Sb2Se3 thin film such as the average intergrain potential barrier height ϕ = 391 meV, the intergrain trap density Nt = 3.4 × 1011 cm−2, the shallow acceptor ionization energy EA0 = 124 meV, the acceptor density NA = 1 × 1017 cm−3, the net donor density ND = 8.3 × 1016 cm−3, and the compensation ratio k = 0, 79 were determined from the analysis of these measurements. ; P. M. P. Salomé acknowledges the funding of Fundação para Ciencêa e Tecnologia (FCT) through the project IF/00133/ ̂2015. This research is supported by the Development of novel ultrathin solar cell architectures for low-light, low-cost, and flexible optoelectronic devices project (028075) co-funded by FCT and ERDF through COMPETE2020. B. Vermang has received funding from the European Research Council (ERC) under the European Union's Horizon 2020 research and innovation program (grant agreement no. 715027). A. Shongalova acknowledges the funding of Erasmus + program 2016/17. This work was funded by FEDER funds through the COMPETE 2020 Programme and by FCTPortuguese Foundation for Science and Technology under the projects UID/CTM/50025/2013. The financial support from Brazilian funding agencies CNPq, CAPES, and FAPEMIG is also acknowledged. ; info:eu-repo/semantics/publishedVersion

In this work, metal-insulator-semiconductor structures were fabricated in order to study different types of insulators, namely, aluminum oxide (Al2O3), silicon nitride, and silicon oxide (SiOx) to be used as passivation layers in Cu(In,Ga)Se-2 (CIGS) thin-film solar cells. The investigated stacks consisted of SLG/Mo/CIGS/insulator/Al. Raman scattering and photoluminescence measurements were done to verify the insulator deposition influence on the CIGS surface. In order to study the electrical properties of the CIGS-insulator interface, capacitance versus conductance and voltage (C-G-V) measurements were done to estimate the number and polarity of fixed insulator charges (Q(f)). The density of interface defects (D-it) was estimated from capacitance versus conductance and frequency (C-G-f) measurements. This study evidences that the deposition of the insulators at high temperatures (300 degrees C) and the use of a sputtering technique cause surface modification on the CIGS surface. We found that, by varying the SiOx deposition parameters, it is possible to have opposite charges inside the insulator, which would allow its use in different device architectures. The material with lower Dit values was Al2O3 when deposited by sputtering. ; This work was supported by European Union's Horizon 2020 research and innovation programme ARCIGS-M project under Grant 720887. The work of J. M. V. Cunha and P. M. P. Salome was supported by the Fundacao para a Ciencia e a Tecnologia (FCT) through the project IF/00133/2015. The work of J. P. Teixeira and J. P. Leitao was supported by the FCT through the project UID/CTM/50025/2013. The work of B. Vermang was supported by the European Research Council under the European Union's Horizon 2020 research and innovation programme under Grant 715027.