Suchergebnisse

Представлены результаты исследования спектров излучения кристаллов и тонких пленок CuInSe2 при непрерывном (2 Вт/см2) и наносекундном импульсном лазерном возбуждении в диапазоне плотности мощности возбуждения ~1–100 кВт/см2 и температурах 10–160 К. Обнаружено, что в кристаллах CuInSe2 стимулированное излучение возникает в спектральной области 1,033 эВ с минимальным уровнем пороговой накачки 9,8 кВт/см2, а при уровнях накачки 36–76 кВт/см2 наблюдается лазерное излучение. Установлено, что для тонких пленок CuInSe2, сформированных на стеклянных подложках с предварительно осажденным на стекло слоем молибдена (структура CuInSe2/Mo/стекло), характерно появление только стимулированного излучения в области энергий 1,014–1,097 эВ с минимальным уровнем пороговой накачки 30 кВт/см2 при температуре 10 К. Обсуждаются механизмы возникновения стимулированного и лазерного излучения в соединении CuInSe2.

Solar cells with the structure ZnO/CdS/Cu2ZnSnSe4/Mo/glass were studied by photoluminescence (PL) before and after irradiation with a dose of 1.8 × 1015 cm−2 and then 5.4 × 1015 cm−2 of 10 MeV electrons carried out at 77 K in liquid nitrogen bath. The low temperature PL spectra before irradiation revealed two bands, a broad and asymmetrical dominant band at 0.94 eV from the CZTSe layer and a lower intensity high energy band (HEB) at 1.3 eV, generated by defects in the CdS buffer layer. Analysis of the excitation intensity and temperature dependencies suggested that the dominant band is free-to-bound (FB): the recombination of free electrons with holes localised at acceptors whose energy levels are affected by potential fluctuations of the valence band due to high concentrations of randomly distributed charged defects. Irradiation did not induce any new band in the examined spectral range (from 0.5 μm to 1.65 μm) but reduced the intensity of both bands in the PL spectra measured at 77 K without warming the cells. The higher the dose the greater was the reduction. After this the cells were warmed to 300 K and moved to a variable temperature cryostat to measure temperature dependencies of the PL spectra. After irradiation the red shift rate of the FB band with temperature rise was found to increase. Electrons displace atoms in the lattice creating primary defects: interstitials and vacancies. These defects recombine during and shortly after irradiation forming secondary defect complexes which work as deep non-radiative traps of charge carriers reducing the PL intensity and increasing the rate of the temperature red shift. Irradiation did not affect the mean depth of the band tails estimated from the shape of the low energy side of the dominant PL band. © 2020 Elsevier Ltd ; European Commission, EC ; European Regional Development Fund, FEDER: TK141 ; Ministry of Science and Higher Education of the Russian Federation: АААА-А18-118020290104-2 ; The research was supported by the Ministry of Science and Higher Education of the Russian Federation (topic "Spin" № АААА-А18-118020290104-2 ) and the European Union through the European Regional Development Fund, Project TK141 .

The light-emitting properties of Si-rich silicon nitride films deposited on the Si (100) substrate by plasma-enhanced (PECVD) and low-pressure chemical vapor deposition (LPCVD) have been investigated. In spite of the similar stoichiometry (SiN1.1), nitride films fabricated by different techniques emit in different spectral ranges. Photoluminescence (PL) maxima lay in red (640 nm) and blue (470 nm) spectral range for the PECVD and LPCVD SiN1.1 films, respectively. It has been shown that equilibrium furnace annealing and laser annealing by ruby laser (694 nm, 70 ns) affect PL spectra of PECVD and LPCVD SiN1.1 in a different way. Furnace annealing at 600 °C results in a significant increase of the PL intensity of the PECVD film, while annealing of LPCVD films result only in PL quenching. It has been concluded that laser annealing is not appropriate for the PECVD film. The dominated red band in the PL spectrum of the PECVD film monotonically decreases with increasing an energy density of laser pulses from 0.45 to 1.4 J/cm2. Besides, the ablation of PECVD nitride films is observed after irradiation by laser pulses with an energy density of > 1 J/cm2. This effect is accompanied by an increase in blue emission attributed to the formation of a polysilicon layer under the nitride film. In contrast, the LPCVD film demonstrates the high stability to pulsed laser exposure. Besides, an increase in the PL intensity for LPCVD films is observed after irradiation by a double laser pulse (1.4 + 2 J/cm2) which has not been achieved by furnace annealing.